Spin-coated photosensitive silver halide photomask

Details Spin-coated photosensitive silver halide photomask Spin-coated photosensitive silver halide photomask

1976-07-30

1978-09-05

Welsh, John D.

Gas separation: apparatus

Electric field separation apparatus

Plural diverse electric fields

96 67, 427240, G03C 172

Patent

active

041116984

ABSTRACT:
A support suitable for spin coating which is transparent to near ultraviolet and visible light and has a flat surface to be coated, wherein the periphery of the surface is removed in an amount of at least the excess thickness at the periphery of a coated layer to be formed by spin coating so that the surface of the coated layer at the periphery is not raised as compared to the surface of the coated layer at the center. A mask blank which has a mask layer formed on the support is also disclosed as is a light-sensitive photographic material which has a silver halide emulsion layer formed on the support or the mask blank. The process is also claimed.

REFERENCES:
patent: 1906199 (1933-04-01), Rado
patent: 3314816 (1967-04-01), Tobex
patent: 3911169 (1975-10-01), Lesaicherre et al.
Reed et al., "Spin Coating Photoresist" IBM Tech. Disc. Bull., vol. 16, #5 (10/1973), pp. 1535-1536.

Affiliated with

Also associated with

Rating

Spin-coated photosensitive silver halide photomask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Spin-coated photosensitive silver halide photomask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Spin-coated photosensitive silver halide photomask will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2093420