Spin cleaning and drying apparatus and method of spin...

Details Spin cleaning and drying apparatus and method of spin... Spin cleaning and drying apparatus and method of spin...

2005-08-19

2008-10-14

Barr, Michael (Department: 1792)

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

C134S001300, C134S095200

Reexamination Certificate

active

07434588

ABSTRACT:
The present invention provides a spin cleaning and drying apparatus of single-wafer processing type which cleans a substrate with a cleaning liquid from a rinse nozzle while rotating the substrate and dries the substrate after cleaning while rotating the substrate, comprising: a spin chuck which holds and rotates the substrates; a cup which has an opening on an upper side, a water discharge port and an exhaust gas port in a bottom portion, and encloses the spin chuck; a flow regulating plate which has a gas injection port in a middle and is provided so as to be able to move backward and forward to a position opposed to the substrate and spaced therefrom at a prescribed distance and to an upward or sideward retracted position; and an exhaust cover, having multiple slit holes each with a hood which opens to an upper surface, is provided below the spin chuck.

REFERENCES:
patent: 4393807 (1983-07-01), Fujimura et al.
patent: 5965200 (1999-10-01), Tateyama et al.
patent: 6793769 (2004-09-01), Kajino et al.
patent: 2004/0261817 (2004-12-01), Araki et al.
patent: 11-330039 (1999-11-01), None

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