Spin-apply tool having exhaust ring

Coating processes – Centrifugal force utilized

Patent

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Details

118 52, 4273855, 437231, B05D 312

Patent

active

060688815

ABSTRACT:
A spin-apply tool avoids contamination of a substrate back surface by providing exhaust along or beyond a periphery of a splash shield. The peripheral exhaust pulls a mist of droplets of liquid spun off the substrate away from the substrate. The spin-apply tool includes a spin chuck for holding the substrate, a basin extending around the chuck, a splash shield in the basin, and an exhaust substantially symmetric with the center of the substrate. The chuck surface defines a plane, and the splash shield extends as a ring around the chuck at an angle to that plane sufficient to deflect liquid flying off the chuck down to the basin. The basin may have a removable liner that can be cleaned and reused. Use of solvent to clean the backside of substrates is avoided. And a basin drain is eliminated, eliminating the need for any solvent consumption.

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patent: 4889066 (1989-12-01), Kawakami
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"SiO2 Sputtering Disposable Liner" by G.F. Cunningham, Jr. IBM Technical Disclosure Bulletin. vol. 14, No. 10, Mar., 1972.
"Disposable Blood Centrifuge Liner" by R.M. Kellogg & J.H. Williams. IBM Technical Disclosure Bulletin. vol. 18, No. 5, Oct., 1975.

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