Speech affect editing systems

Details Speech affect editing systems Speech affect editing systems

2007-10-18

2011-10-11

Albertalli, Brian (Department: 2626)

Data processing: speech signal processing, linguistics, language

Speech signal processing

Application

C704S009000, C704S258000

Reexamination Certificate

active

08036899

ABSTRACT:
This invention generally relates to system, methods and computer program code for editing or modifying speech affect. A speech affect processing system to enable a user to edit an affect content of a speech signal, the system comprising: input to receive speech analysis data from a speech processing system said speech analysis data, comprising a set of parameters representing said speech signal; a user input to receive user input data defining one or more affect-related operations to be performed on said speech signal; and an affect modification system coupled to said user input and to said speech processing system to modify said parameters in accordance with said one or more affect-related operations and further comprising a speech reconstruction system to reconstruct an affect modified speech signal from said modified parameters; and an output coupled to said affect modification system to output said affect modified speech signal.

REFERENCES:
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patent: 7373294 (2008-05-01), Cezanne et al.
patent: 2003/0033145 (2003-02-01), Petrushin
patent: 2003/0093280 (2003-05-01), Oudeyer
Shikler et al., “Affect Editing in Speech”, ACII 2005, LNCS 3784, pp. 411-418, 2005.
Fujisawa et al., “On the Role of Pitch Intervals in the Perception of Emotional Speech”, ISCA & IEEE Workshop on Spontaneous Speech Processing and Recognition, Tokyo Institute of Technology, Tokyo, Japan, Apr. 13-16, 2003.
Cook et al., “Evaluation of the Affective Valence of Speech Using Pitch Substructure”, IEEE Transactions on Audio, Speech, and Language Processing, vol. 14, No. 1, Jan. 2006, pp. 142-151.
Cook et al., “Application of a Psychoacoustical Model of Harmony to Speech Prosody”, Speech Prosody 2004, Nara, Japan, Mar. 23-26, 2004.

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