Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Reexamination Certificate
2006-06-13
2006-06-13
Lauchman, Layla G. (Department: 2877)
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
C430S022000, C430S030000, C257S797000
Reexamination Certificate
active
07061615
ABSTRACT:
An overlay target for spectroscopic measurement includes at least two diffraction gratings, one grating overlying the other. The diffraction gratings may include an asymmetry relative to each other in order to improve resolution of the presence as well as the direction of any mis-registration. For example, the asymmetry between the two diffraction gratings may be a phase offset, a difference in pitch, line width, etc. The overlay target may be spectroscopically measuring, for example, using an optical model and a best fit analysis. Moreover, the overlay target may be optimized by modeling the overlay target and adjusting the variable parameters and calculating the sensitivity of the overlay target to changes in variable parameters.
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Lauchman Layla G.
Nanometrics Incorporated
Silicon Valley Patent & Group LLP
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