Spectroscopic monitoring of gas-solid processes

Details Spectroscopic monitoring of gas-solid processes Spectroscopic monitoring of gas-solid processes

1981-07-17

1983-07-19

Demers, Arthur P.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204192R, 204298, 156345, 156643, C23C 1500

Patent

active

043942377

ABSTRACT:
A method for accurately monitoring and adjusting gas phase processes such as gas etching and chemical vapor deposition has been found. This method relies on the use of induced fluorescence. The gaseous phase used in the process to be monitored is probed by excitation with a suitable energy source. The emission from the gas phase induced through this excitation is then monitored and yields an accurate measure of concentration of the active species present. In turn the conditions of the fabrication process are adjusted based on these discerned concentrations.

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