Spectrophotometric supercritical fluid contamination monitor

Details Spectrophotometric supercritical fluid contamination monitor Spectrophotometric supercritical fluid contamination monitor

1992-05-12

1998-07-07

Warden, Robert J.

Optics: measuring and testing

With sample preparation

Depositing particles on optical surface

250341, G01N 100

Patent

active

057777268

ABSTRACT:
A system for detecting the presence of contaminants in a flowing stream of supercritical fluid. A sample stream is removed from a flowing stream of supercritical fluid and subjected to reduced pressure in a contaminant measurement zone. The supercritical fluid turns into gas at the reduced pressure with the contaminants remaining in a non-gaseous form. An attenuated total reflectance plate is used to spectrophotometrically detect the presence of the non-gaseous contaminants which deposit on the surface of the plate within the contaminant measurement zone. The system is useful for spectrophotometrically detecting the presence and identity of contaminants in supercritical fluids and is useful in monitoring both cleaning processes and extraction processes.

REFERENCES:
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Grandprie et al, "Thin Film Planar Waveguide Sensor for Liquid Phase Absorbance Measurements," Analytical Chemistry, vol. 62, No. 18, Sep. 15, 1990.

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