Spectrophotometric analysis

Optics: measuring and testing – By dispersed light spectroscopy – Utilizing a spectrophotometer

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Details

356326, 356446, 25033911, G01J 302, G01J 342

Patent

active

058597034

ABSTRACT:
The present invention relates to an apparatus for spectrophotometric analysis of a material in a container by reflectance of a beam applied to the material through an aperture in a primary mask. A restricted beam resulting from the primary mask is applied through a port in an opaque secondary mask to the material. The restricted beam is wholly within the port and radiation reflected from the material passes through the port to detectors for analysis. The secondary mask defines by its port an area on the base of the container through which the restricted beam is applied to the material and is not subjected to spurious reflections and refractions otherwise created by the container between its base and side wall. The container may be spaced from the secondary mask and inclined relative thereto so that the secondary mask shields the top and bottom ends of the container.
The present invention also relates to a conversion kit with primary and secondary masks for fitting to existing spectrophotometers and an apparatus by which an array of containers can be fed successively and automatically to overlie the port for analysis and thereafter removed.

REFERENCES:
patent: 2311101 (1943-02-01), Tuttle et al.
patent: 4073590 (1978-02-01), Brown
patent: 5478750 (1995-12-01), Bernstein et al.
Abstract of JP 61-34428.
Abstract of JP 62-28622.
Abstract of JP 63-172931.
Abstract of JP 06-011440.

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