Spectrally tailored wafer chuck shaped light meter

Optics: measuring and testing – By dispersed light spectroscopy – Utilizing a spectrometer

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356334, G01J 318

Patent

active

044626886

ABSTRACT:
An Ebert monochromator is modified in a wafer chuck format and adapted to received and sum spectrally tailored light in discrete band widths so that the meter emulates the photographic response of photo resist to light from a high pressure mercury lamp. The monochromator light path is placed between two closely spaced parallel mirrors (spaced apart on the order of 1/8 of an inch). The apparatus includes a circular entrance aperture having a right angle deflecting cone directed to a slit. That slit thereafter emits light to a cylindrical mirror. At the cylindrical mirror, collimated light rebounds to and on a diffraction grating. The light is chromatically classified at the diffraction grating, rebounds to the cylindrical mirror and on reflection passes to a focussing plane. At the focussing plane the particular spectra detected is displayed. Two apparatus are disclosed for tuning the spectral response of the light meter to the spectral response of the photo resist. In one embodiment moveable shutter elements at preselected intervals on either side of the focussing plane in an alternating pattern are located. By placing a photo sensor downstream of the apertures and focal plane, the flow of light through the light meter is integrated and as spectrally tailored closely parallels the response of the photo resist. According to a second and preferred embodiment, a photo diode array is placed at the focussing plane of the monochromator. The diodes are discretely tuned in their response to emulate the response of the photo resist. The output of the light meter in sum emulates the exposure characteristics of the photo resist.

REFERENCES:
patent: 2823577 (1958-02-01), Machler
patent: 3549261 (1970-12-01), Hach
patent: 4193691 (1980-03-01), Fjarlie
patent: 4253765 (1981-03-01), Kato et al.

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