Spectral purity filter, lithographic apparatus including...

Details Spectral purity filter, lithographic apparatus including... Spectral purity filter, lithographic apparatus including...

2004-12-30

2008-11-18

Hasan, Mohammed (Department: 2873)

Optical: systems and elements

Single channel simultaneously to or from plural channels

By partial reflection at beam splitting or combining surface

C359S619000, C359S649000

Reexamination Certificate

active

07453645

ABSTRACT:
A spectral purity filter includes an aperture, the aperture having a diameter, wherein the spectral purity filter is configured to enhance the spectral purity of a radiation beam by reflecting radiation of a first wavelength and allowing at least a portion of radiation of a second wavelength to transmit through the aperture, the first wavelength being larger than the second wavelength. The spectral purity filter may be used to improve the spectral purity of an Extreme Ultra-Violet (EUV) radiation beam.

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patent: 5103100 (1992-04-01), Iketaki
patent: 6456362 (2002-09-01), Banine
patent: 6809327 (2004-10-01), Bristol
patent: 6987599 (2006-01-01), Sandstrom
patent: 7221514 (2007-05-01), Venema
patent: 2004/0036977 (2004-02-01), Tanaka et al.
patent: 2004/0169838 (2004-09-01), Lee

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