Optics: measuring and testing – Standard
Patent
1994-06-14
1995-09-26
McGraw, Vincent P.
Optics: measuring and testing
Standard
G01J 102, G01N 2188
Patent
active
054538300
ABSTRACT:
A test device for calibrating an optical surface inspection system, such as a pellicle or reticle inspection system, comprising a substrate having raised diffractors with at least one beam-diffracting geometric feature aligned to diffract light directed from an angle of incidence of less than 30.degree. . The beam-diffracting geometric feature is preferably a vertex aligned generally perpendicular to the surface of the substrate. A detection beam which impinges the vertex is diffracted, with diffracted beams being collected by a collector. The raised diffractor thereby simulates a foreign particle on a substrate, allowing calibration of the system. The apparent size of the diffractor and therefore the simulated particle can be varied by varying the vertices or the height of the raised diffractor. If a substrate is to have more than one diffractor, the diffractor should be spaced apart by a distance greater than the diameter of the detection beam.
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Gaston, C. A., "Standard Wafer for Intensity and Focus Testing," IBM Technical Disclosure Bulletin, vol. 24, No. 11A, Apr. 1982.
Hantis K. P.
McGraw Vincent P.
VLSI Standards, Inc.
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