Spatially controlled, in situ synthesis of polymers

Details Spatially controlled, in situ synthesis of polymers Spatially controlled, in situ synthesis of polymers

2005-03-22

2005-03-22

Seidleck, James J. (Department: 1711)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Compositions to be polymerized by wave energy wherein said...

C522S173000, C522S001000, C522S071000, C522S074000, C522S178000, C522S182000, C522S184000, C522S188000, C522S910000, C522S104000, C522S107000

Reexamination Certificate

active

06869983

ABSTRACT:
An in situ polymer microstructure formation method. The monomer mixture is polymerized in a solvent/precipitant through exposure to ionizing radiation in the absence any chemical mediators. If an exposure mask is employed to block out certain regions of the radiation cross section, then a patterned microstructure is formed. The polymerization mechanism is based on the so-called free-radical retrograde-precipitation polymerization process, in which polymerization occurs while the system is phase separating above the lower critical solution temperature. This method was extended to produce a crosslinked line grid-pattern of poly (N-isopropylacrylamide), which has been known to have thermoreversible properties.

REFERENCES:
patent: 5173551 (1992-12-01), Caneba

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