Spatial phase modulating masks and production processes thereof,

Details Spatial phase modulating masks and production processes thereof, Spatial phase modulating masks and production processes thereof,

1986-03-20

1989-02-21

Dees, Jose G.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

430321, 430323, 430324, 350320, 35016217, G03F 900

Patent

active

048064424

ABSTRACT:
Spatial phase modulating transparent masks comprising two or more portions having two different optical paths and their production processes are disclosed. The transparent masks are particularly useful as an exposure mask in the production of phase-shifted, distributed feedback (DFB) semiconductor lasers for a single-mode operation. A process for the formation of phase-shifted diffraction gratings or corrugations which comprises exposing a substrate, through the above transparent mask, to exposure radiation is also disclosed. According to the present invention, the phase-shifted diffraction gratings can be easily and directly produced with a high accuracy and reliability.

REFERENCES:
patent: 3940274 (1976-02-01), MacAnally
patent: 4068260 (1978-01-01), Ohneda et al.
patent: 4155627 (1979-05-01), Gale et al.
patent: 4360586 (1982-11-01), Flanders et al.

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