Chemistry: electrical and wave energy – Apparatus – Electrolytic
Reexamination Certificate
2000-03-16
2001-09-04
Bell, Bruce F. (Department: 1741)
Chemistry: electrical and wave energy
Apparatus
Electrolytic
C204S288000, C204S288100, C204S289000
Reexamination Certificate
active
06284109
ABSTRACT:
BACKGROUND OF THE INVENTION
Priority for this application is claimed from Provisional Patent Application Ser. No. 60/177,791, entitled “Spacer Mechanism for Anodes” filed on Jan. 24, 2000.
This invention relates generally to electro-deposition systems and more particularly to anodes used within such systems.
Electrowinning tanks are used for the extraction of metals from solution by using electrochemical processes. This type of process is commonly used in the extraction of copper onto cathode plates.
Typically, the cathodes and anodes are placed within a slurry containing the sought-after ore. An electrical flow is induced between the anode and the cathode resulting an the ore being deposited onto the cathode. When sufficient deposition has occurred, the cathode is removed and the ore is removed from the cathode.
Spacing between the cathode and anode is critical to assure proper ore deposition. Too narrow of spacing may result in an electrical short occurring; to wide of spacing diminishes the speed of deposition.
To assure proper spacing between the anode and the cathode, a spacer is secured to the bottom of the anode to maintain the desired spacing. This spacer is typically conical shaped to assist in the re-placement of the cathode within the slurry between anodes; that is, the conical shape provides a smooth surface over which the cathode passes when re-inserted into the tank.
Unfortunately, this ideal shape also creates a “vortex” through which the electrical flow swirls. This swirling of the electrical flow can create harmful affects on the cathode as the electrical flow causes the ore to be deposited onto the cathode.
The present invention provides an improved spacer which eliminates this swirling affect.
SUMMARY OF THE INVENTION
The present invention create a spacer mechanism which is used to separate electrodes within an electrowinning process. As noted above, positioning of the electrodes within an electro-deposition or electrowinning process is critical to assure a properly controlled deposition activity.
The spacers have a central body portion which defines the distancing between the electrodes and at least four sloping arms extending from the central body. The shape of the central portion is varied to meet the needs of the particular instance. The central body has a generally circular cross section; although, square cross sectional designs are also contemplated.
To assist with the placement of electrodes during assembly within the electrowinning tanks, the arms are used to move the electrodes to the top of the central body of the spacer. The slope of the arms assures that the electrode as it is lowered, engages one of the sloped arms and is “pushed” away from the electrode having the spacer.
Each of the arms is ideally narrow so that the “footprints” of the spacer is minimized. The preferred embodiment of the invention provides that the width of the arms is less than half the width of the central body.
The small “footprint” causes minimal disruption of the electrical flow between the electrodes so that the electro-deposition process proceeds in a uniform manner. Since the electrical flow is maintained without disruption, variations in the metal deposition is avoided; a generally uniform layer of metal is deposited.
In more detail, the present invention provides for a spacer which has a generally uniform width for its central core. Extending from this center core are alignment wings which assist in aligning the cathode when it is replaced. Each alignment wing has a tapered upper surface for this purpose. In the preferred embodiment, four alignment wings are employed.
In the preferred embodiment, the spacers are manufactured using Injection molding techniques. Compression molding is also employed in some embodiments.
The preferred embodiment is made from acrylic poly vinyl chloride, poly vinyl chloride or vinyl ester which is highly acid resistant and impact resistant to extend its life within the harsh environment in which it is found. This material is also ideal in that should the spacer be broken (partially or wholly), the debris sinks within the tank to avoid jamming of pumps and other equipment within the electro-deposition operation.
The present invention provides for a variety of attributes, including, but not limited to:
1) Ease of Instillation;
2) Compression or injection molded for strength;
3) Material is acid resistant;
4) Material is very impact resistant;
5) Material is non-conductive;
6) The shape makes it easier for electric current to flow around leaving less of a shadow or no shadow on copper cathode;
7) If broken, the spacers sink rather then floating into oven flow and jamming pumps; and,
8) Used to keep anodes and cathodes equal distance from each other to give maximum even current flow for better quality copper and even growth.
The invention, together with various embodiments thereof, will be more fully explained by the accompanying drawings and the following description thereof.
REFERENCES:
patent: 4154667 (1979-05-01), Pohto et al.
patent: 4338179 (1982-07-01), Dickson et al.
patent: 4448664 (1984-05-01), Ikegami et al.
patent: 4824543 (1989-04-01), Peterson et al.
patent: 5094735 (1992-03-01), Lang, Jr.
patent: 5762776 (1998-06-01), Alexander et al.
patent: 5993620 (1999-11-01), Meneghini et al.
Bell Bruce F.
Ogram P.C. Mark E.
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