Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1980-12-30
1982-03-16
Williams, Howard S.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
B01D 1302
Patent
active
043199780
ABSTRACT:
An improved spacer for use in an electrodialysis stack, the spacer comprising an inner ply, two intermediate plies, and two outer plies of a compressible material. These plies are held together by a water-resistant, pressure-sensitive adhesive with the inside of each intermediate ply being bonded to a side of the inner ply and each outer ply being bonded to the outside of an intermediate ply. The resulting spacer is assembled into an electrodialysis stack alternating with anion and cation selective membranes, the spacer and membranes being held in place by externally applied pressure to form a stack which is free from cross-leaking and seepage problems, and yet readily disassembled for servicing.
REFERENCES:
patent: 2758083 (1956-08-01), Van Hoek et al.
patent: 2784158 (1957-03-01), Bodamer et al.
patent: 3761386 (1973-09-01), Smith
patent: 3869375 (1975-03-01), Ono et al.
patent: 3878086 (1975-04-01), Haswell et al.
Goldberg Robert L.
Lea Manufacturing Company
Williams Howard S.
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