Source for providing an electron beam of settable power

Details Source for providing an electron beam of settable power Source for providing an electron beam of settable power

2011-03-22

2011-03-22

Williams, Joseph L (Department: 2889)

Electric lamp and discharge devices

Fluent material supply or flow directing means

Plasma

C313S362100, C315S111210

Reexamination Certificate

active

07911120

ABSTRACT:
The invention concerns a source supplying an adjustable energy electron beam, comprising a plasma chamber (P) consisting of an enclosure (1) having an inner surface of a first value (S1) and an extraction gate (2) having a surface of a second value (S2), the gate potential being different from that of the enclosure and adjustable. The invention is characterized in that the plasma is excited and confined in multipolar or multidipolar magnetic structures, the ratio of the second value (S2) over the first value (S1) being close to: D=1/β √2πme/miexp (−½), wherein: β is the proportion of electrons of the plasma P, methe electron mass, and miis the mass of positively charged ions.

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Tanaka S. et al.: “Design and Experimental Results of a New Electron Gun Using a Magnetic Multipole Plasma Generator”, Review of Scientific Instruments, American Institute of Physics, New York, US, vol. 62, No. 3, Mar. 1, 1991, pp. 761-771.
Part 5.5.2 “Electron beam characteristics of minaturized ECR plasma cathodes” of work “Electron Cyclotron Resonance Ion Sources and ECR Plasmas” by R. Geller, published by the Institute of Physics Publishing Bristol and Philadelphia (pp. 352-353); Jul. 25, 1997.

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