Solving production down time with parallel low pressure sensors

Measuring and testing – Instrument proving or calibrating – Fluid pressure

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G01L 2700

Patent

active

058081755

ABSTRACT:
An in-process method and apparatus for monitoring and correcting or replacing a low pressure sensor that gives incorrect low pressure readings because of being contaminated or defective during the formation of integrated circuit structures in a low pressure chemical vapor deposition chamber, where deposition rates are a function of gas flow, temperature, and chamber pressure.

REFERENCES:
patent: 4051712 (1977-10-01), Zias et al.
patent: 4658829 (1987-04-01), Wallace
patent: 5348614 (1994-09-01), Jerbic
patent: 5443997 (1995-08-01), Tsui et al.

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