Solvents for photoresist removal

Details Solvents for photoresist removal Solvents for photoresist removal

1986-10-20

1988-08-23

Albrecht, Dennis

Cleaning and liquid contact with solids

Processes

Paints, varnishes, lacquers, or enamels, removal

252153, 252364, 252DIG8, 430329, C11D 732, C09D 904, C23D 1700

Patent

active

047658444

ABSTRACT:
The invention relates to solvent systems which are based on water-soluble amino derivatives and propylene glycol components, for removing photoresists. These solvent systems are comprised of

REFERENCES:
patent: 3673099 (1972-06-01), Corby et al.
patent: 3796602 (1974-03-01), Briney et al.
patent: 4077896 (1978-03-01), Bunegar et al.
patent: 4592787 (1986-06-01), Johnson
patent: 4617251 (1986-10-01), Sizensky
W. S. De Forest (Photoresist: Materials and Processes, pp. 203-207, McGraw-Hill Book Co., 1975.
Patent Abstracts of Japan, Band 7, Nr. 6 (P-167[1151], 11 Jan. 1983; and JP-A-57 165 834 (Hitachi Kasei Kogyo K.K.) 13-10-1982.
Patent Abstracts of Japan, Band 7, Nr. 54 (P-180) [1199], 4 Mar. 1983; and JP-A-57 202 540 (Mitsuwaka Jiyunyaku Kenkyusho K.K.) 11-12-1982.

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