Solvent developable photoresist film

Details Solvent developable photoresist film Solvent developable photoresist film

1980-12-17

1982-09-14

Brown, J. Travis

Radiation imagery chemistry: process, composition, or product th

Stripping process or element

Element

430258, 430271, 430273, 430277, 430311, 430502, 428212, 1566611, G03C 158

Patent

active

043496202

ABSTRACT:
A multi-layer photosensitive film resist (is provided) in which the photosensitive layers consists of a plurality of layers having different properties, e.g., greater adhesion to a copper surface provided by one layer and greater toughness and (possibly) reduced adhesion to a temporary support provided by the other layer.

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patent: 3905815 (1975-09-01), Bonham
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patent: 3934057 (1976-01-01), Moreau et al.
patent: 4024293 (1977-05-01), Hatzakis
patent: 4050936 (1977-09-01), Takeda
patent: 4126466 (1978-11-01), Roos

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