Solvent composition for cleaning silicon wafers

Details Solvent composition for cleaning silicon wafers Solvent composition for cleaning silicon wafers

1987-08-28

1989-05-09

Lieberman, Paul

Compositions

Water-softening or purifying or scale-inhibiting agents

252170, 252153, 252162, 252 67, 134 40, 134 42, 134 39, C09D 900, C11D 750, C23G 502

Patent

active

048287512

ABSTRACT:
There is provided an improved solvent especially adapted for cleaning silicon wafers and consisting essentially of a haloalkylhydrocarbon and a partially fluorinated alcohol. This solvent provides excellent cleaning and drying of the wafer.

REFERENCES:
patent: 3509061 (1970-04-01), Zisman et al.
patent: 3957672 (1976-05-01), Zisman et al.
patent: 4303558 (1981-12-01), Hay
patent: 4465610 (1984-08-01), Enjo et al.
patent: 4530776 (1985-07-01), Hisamoto et al.

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