Solvent bath and drain

Details Solvent bath and drain Solvent bath and drain

2008-04-15

2008-04-15

Tadesse, Yewebdar (Department: 1792)

Coating apparatus

Projection or spray type

With projector heating, cleaning or conditioning

C118S323000, C118S052000, C239S106000

Reexamination Certificate

active

07357840

ABSTRACT:
According to one aspect of the invention, a wafer processing apparatus is provided. The wafer processing apparatus may include a wafer support, a dispense head, and a solvent bath. The dispense head may be moveable between a position over the wafer support and a position over the solvent bath. When the dispense head is positioned over the solvent bath, a fluid dispensed from the dispense head may enter a drain and nozzles on the dispense head may be exposed to a controlled atmosphere within a chamber of the solvent bath.

REFERENCES:
patent: 5002008 (1991-03-01), Ushijima et al.
patent: 5938847 (1999-08-01), Akimoto et al.
patent: 5993552 (1999-11-01), Tsukamoto et al.
patent: 6210481 (2001-04-01), Sakai et al.
patent: 6715943 (2004-04-01), Nagamine
patent: 2001205162 (2001-07-01), None
English Translated Abstract and Detailed Description of JP-2001-205162A.
ASML. 9X Track System Solvent Bath, Figures 1-3 and description of Figures, Jun. 2000. (4 pages).

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