Soluble fluorinated cycloalkane sulfonate surfactant additives f

Details Soluble fluorinated cycloalkane sulfonate surfactant additives f Soluble fluorinated cycloalkane sulfonate surfactant additives f

1985-05-13

1986-11-04

Powell, William A.

Compositions

Etching or brightening compositions

Inorganic acid containing

156653, 156657, 1566591, 252142, 252 793, C09K 1306, B44C 122, C03C 1500, C03C 2506

Patent

active

046209344

ABSTRACT:
Silicon dioxide etching solutions with soluble surfactant additives are provided. The improved silicon dioxide etchants are produced by adding soluble fluorinated surfactant additives to standard oxide etchants in the manufacture of integrated circuits. The surfactants found effective in accordance with the invention are referred to as fluorinated cycloalkane sulfonates and fluorinated cycloalkene sulfonates and have the general formula ##STR1## where X is F, H, Cl, OH, SO.sub.3 A or R and Y is F, H, OH, R or be omitted and thereby impart a double bond; wherein R is a 1 to 4 fluoroalkyl group; and wherein n has a value of up to 6. A represents as the cation group may be NH.sub.4.sup.+, H.sup.+, Na.sup.+, K.sup.+, Li.sup.+, R.sup.+ or organic amine cations.

REFERENCES:
patent: 3650960 (1972-03-01), Strauss et al.
patent: 4040897 (1977-08-01), Blish et al.
patent: 4517106 (1985-05-01), Hopkins et al.

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