Solid-transformation thermal resist

Details Solid-transformation thermal resist Solid-transformation thermal resist

1985-04-12

1986-10-28

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Electron beam

430270, 430276, 430311, 430325, 430330, 430945, 430967, 156628, C23C 1500

Patent

active

046198946

ABSTRACT:
A negative resist and masking process for microfabrication comprising an evaporated film of aluminum and oxygen which, in the as-deposited state, is highly conductive and has low resistance to etching, but when exposed to active radiation, such as by pulse laser thermal excitation, converts to a low electrical conductivity, high etchant resistive phase.

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Properties of Aluminum-Base Cermet Thin Film Resistors, Thin Solid Films, pp. 275-285, J. Vac. Sci. Tech., B3(1), Jan./Feb. 1985.

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