Solid-state laser system for ultra-violet micro-lithography

Details Solid-state laser system for ultra-violet micro-lithography Solid-state laser system for ultra-violet micro-lithography

1996-11-22

1999-08-17

Scott, Jr., Leon

Coherent light generators

Particular beam control device

Nonlinear device

372 23, 372 5, 372 20, H01S 310

Patent

active

059404183

ABSTRACT:
A solid state laser systems for generating highly monochromatic laser radiation at wavelengths of interest for advanced micro-lithography, particularly 248 nanometer and 193 nanometer wavelengths. At least one Nd:YAG laser produces a 1,064 nm laser beam consisting of narrow-linewidth pulses of infra-red laser radiation having a pulse duration of less than 30 nanoseconds, at a pulse rate preferably in excess of 500 pulses per second with pulse energy greater than 20 millijoules. This radiation is frequency doubled and frequency tripled to produce 532 nm and 355 nm pulsed laser beams. These beams are then further optically processed to generate the ultra-violet wavelength for micro-lithography at either 248 nm or 193 nm.

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patent: 5117126 (1992-05-01), Geiger
patent: 5144630 (1992-09-01), Lin
patent: 5274650 (1993-12-01), Amano
patent: 5400173 (1995-03-01), Komine
patent: 5477378 (1995-12-01), Johnson
Pixton, "Tripling yag frequency," Laser Focus, pp. 66-70 (Jul. 1978).

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