Solid state laser device for lithography light source and semico

Details Solid state laser device for lithography light source and semico Solid state laser device for lithography light source and semico

1990-09-21

1992-05-12

Epps, Georgia Y.

Coherent light generators

Particular beam control device

Nonlinear device

372 20, 372 21, H01S 310

Patent

active

051134020

ABSTRACT:
A non-linear optical material is used to convert a solid state laser ray of light output of a first wavelength into light of a shorter wavelength. The light output of shorter wavelength is suitable for use as a light source for lithography. Wavelengths as short as those obtained by excimer laser devices can be achieved. When the light source is used in lithography, the degree of integration of ICs for the new generation of 16MDRAM can be achieved more safely and simply than possible with excimer lasers.

REFERENCES:
patent: 4272694 (1981-06-01), Jacobs
patent: 4346314 (1982-08-01), Craxton
patent: 4599727 (1986-07-01), Jenssen
patent: 4791927 (1988-12-01), Menger
patent: 4873692 (1989-10-01), Johnson et al.

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