Solid-state imaging device and its manufacturing method

Details Solid-state imaging device and its manufacturing method Solid-state imaging device and its manufacturing method

2011-07-26

2011-07-26

Prenty, Mark (Department: 2822)

Active solid-state devices (e.g., transistors, solid-state diode

Responsive to non-electrical signal

Electromagnetic or particle radiation

C257SE31127

Reexamination Certificate

active

07986019

ABSTRACT:
A solid-state imaging device includes a semiconductor substrate having a photoelectric conversion region, a first microlens provided above the semiconductor substrate, covering the photoelectric conversion region, and having a convex upper surface, for gathering external light into the photoelectric conversion region, and a second microlens provided above the first microlens and having a convex upper surface, for gathering external light into the first microlens. A flat surface is provided at a top portion of one of the first and second microlenses and immediately above the photoelectric conversion region.

REFERENCES:
patent: 2005/0161585 (2005-07-01), Nakashima et al.
patent: 2007/0090419 (2007-04-01), Lee
patent: 2009/0085137 (2009-04-01), Kuriyama
patent: 04-012568 (1992-01-01), None
patent: 06-061462 (1994-03-01), None
patent: 11-040787 (1999-02-01), None

Affiliated with

Also associated with

Rating

Solid-state imaging device and its manufacturing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Solid-state imaging device and its manufacturing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Solid-state imaging device and its manufacturing method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2734557