Solid-state imaging device

Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal – Electromagnetic or particle radiation

Reexamination Certificate

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Details

C257S444000, C257S446000

Reexamination Certificate

active

08035178

ABSTRACT:
A plurality of pixel portions (12) are formed on a silicon substrate (11). A photoelectric converter portion (10) constituting each of the pixel portions (12) is electrically isolated by an element isolation portion (13) comprising an insulating film formed on the silicon substrate (11). The photoelectric converter portion (10) partitioned by the element isolation portion (13) is so formed that a crystal orientation of the sides in contact with the element isolation portion (13) corresponds to a <00-1> direction. This makes it possible to reduce dark current caused by stress in the vicinity of the interface of the element isolation portion (13) and maintain high sensitivity even if the pixel portions (12) are made smaller in size.

REFERENCES:
patent: 6537895 (2003-03-01), Miller et al.
patent: 7285482 (2007-10-01), Ochi
patent: 7750423 (2010-07-01), Yokoyama
patent: 2006/0141655 (2006-06-01), Tamura et al.
patent: 2007/0023801 (2007-02-01), Hynecek
patent: 2007/0194400 (2007-08-01), Yokoyama
patent: 2001-015586 (2001-01-01), None
patent: 2003-318379 (2003-11-01), None
patent: 2006-186204 (2006-07-01), None
patent: 2006-222452 (2006-08-01), None
patent: 2006-294756 (2006-10-01), None
patent: 2007-036202 (2007-02-01), None
patent: 2008-060380 (2008-03-01), None

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