Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal – Electromagnetic or particle radiation
Reexamination Certificate
2005-10-28
2009-06-23
Pham, Long (Department: 2814)
Active solid-state devices (e.g., transistors, solid-state diode
Responsive to non-electrical signal
Electromagnetic or particle radiation
C257S431000, C257SE31001
Reexamination Certificate
active
07550814
ABSTRACT:
A solid-state imaging device including: a plurality of photosensitive cells, each having a photodiode, arranged on a semiconductor substrate (1) in a matrix; and a peripheral driving circuit that has a plurality of transistors for driving the plurality of photosensitive cells. The plurality of transistors includes a first transistor and a second transistor, the first transistor having a first diffusion layer (2) as a source or a drain where a signal potential corresponding to a signal charge generated by the photodiode is transmitted and held, and the second transistor having a second diffusion layer as a source and a drain where the signal potential is not transmitted. An edge interval (D1) between an edge of a metal silicide layer (4) formed on a surface of the first diffusion layer and an edge of a gate electrode (6) in the first transistor is larger than an edge interval between an edge of a metal silicide layer formed on a surface of the second diffusion layer and an edge of a gate electrode in the second transistor. It is possible to suppress a leakage current in the transistors in the peripheral driving circuit, and to hold picked-up image information with high accuracy.
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International Search Report from the corresponding PCT/JP2005/019913, mailed Jan. 10, 2006.
Kazuya Yonemoto, “Basics and Applications of CCD/CMOS Image Sensor”, CQ Publishing Co., Ltd., p. 175-176. (Partial English translation included), Aug. 2003.
Mimuro Ken
Ochi Mototaka
Uchida Mikiya
Hamre Schumann Mueller & Larson P.C.
Panasonic Corporation
Pham Long
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