Solid-state imaging device

Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal – Electromagnetic or particle radiation

Reexamination Certificate

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Details

C257S431000, C257SE31001

Reexamination Certificate

active

07550814

ABSTRACT:
A solid-state imaging device including: a plurality of photosensitive cells, each having a photodiode, arranged on a semiconductor substrate (1) in a matrix; and a peripheral driving circuit that has a plurality of transistors for driving the plurality of photosensitive cells. The plurality of transistors includes a first transistor and a second transistor, the first transistor having a first diffusion layer (2) as a source or a drain where a signal potential corresponding to a signal charge generated by the photodiode is transmitted and held, and the second transistor having a second diffusion layer as a source and a drain where the signal potential is not transmitted. An edge interval (D1) between an edge of a metal silicide layer (4) formed on a surface of the first diffusion layer and an edge of a gate electrode (6) in the first transistor is larger than an edge interval between an edge of a metal silicide layer formed on a surface of the second diffusion layer and an edge of a gate electrode in the second transistor. It is possible to suppress a leakage current in the transistors in the peripheral driving circuit, and to hold picked-up image information with high accuracy.

REFERENCES:
patent: 6025620 (2000-02-01), Kimura et al.
patent: 7342269 (2008-03-01), Yuzurihara
patent: 1 075 028 (2001-02-01), None
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patent: 2001-274259 (2001-10-01), None
patent: 2002-134743 (2002-05-01), None
patent: 2002-198523 (2002-07-01), None
International Search Report from the corresponding PCT/JP2005/019913, mailed Jan. 10, 2006.
Kazuya Yonemoto, “Basics and Applications of CCD/CMOS Image Sensor”, CQ Publishing Co., Ltd., p. 175-176. (Partial English translation included), Aug. 2003.

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