Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Charge transfer device
Reexamination Certificate
2006-11-21
2006-11-21
Flynn, Nathan J. (Department: 2826)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Charge transfer device
C257S213000, C257S215000, C257S216000, C257SE27130
Reexamination Certificate
active
07138671
ABSTRACT:
A first p+-type region on a surface of a photodiode unit is formed over a region from a surface of the photodiode unit through a surface of a signal charge read-out unit until reaching the charge transfer unit. Also, the following structure is adapted: the structure in which a boundary between the first p+-type region and a p++-type region is not on a same plane with a boundary of an n-type impurity region which forms the photodiode unit on a side of the signal charge read-out unit. Further, a second p+-type region is formed between the first p+-type region and the p++-type region on the surface of the photodiode unit. The second p+-type region has an impurity concentration between the impurity concentrations of the first p+-type region and the p++-type region.
REFERENCES:
patent: 7-142696 (1995-06-01), None
patent: 10-050976 (1998-02-01), None
Hirai Jun
Yamada Tooru
Flynn Nathan J.
Matsushita Electric - Industrial Co., Ltd.
Quinto Kevin
Wenderoth , Lind & Ponack, L.L.P.
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