Solid source MOCVD system

Details Solid source MOCVD system Solid source MOCVD system

1997-05-30

1998-10-13

Bueker, Richard

Coating apparatus

Control means responsive to a randomly occurring sensed...

Responsive to condition of coating material

118689, 118708, 118712, 118725, 118726, C23C 1600

Patent

active

058206787

ABSTRACT:
A system for MOCVD fabrication of superconducting and non-superconducting oxide films provides a delivery system for the feeding of metalorganic precursors for multi-component chemical vapor deposition. The delivery system can include multiple cartridges containing tightly packed precursor materials. The contents of each cartridge can be ground at a desired rate and fed together with precursor materials from other cartridges to a vaporization zone and then to a reaction zone within a deposition chamber for thin film deposition.

REFERENCES:
patent: 5447569 (1995-09-01), Hiskes
patent: 5476547 (1995-12-01), Mikoshiba
patent: 5553395 (1996-09-01), Wen

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