Metal working – Barrier layer or semiconductor device making – Barrier layer device making
Reexamination Certificate
2008-10-31
2011-10-18
Ghyka, Alexander (Department: 2812)
Metal working
Barrier layer or semiconductor device making
Barrier layer device making
Reexamination Certificate
active
08038738
ABSTRACT:
A solid electrolytic capacitor manufacturing method includes a process of removing a roughened surface layer (10a′) from a distal portion (13) of a metal member (10) and from part of an intermediate portion (12) adjacent to the distal portion (13), a process of forming a resist (40) on the distal portion (13) and the intermediate portion (12) of the metal member (10), a process of forming a conductive polymer layer (30) of a conductive polymer on a proximal portion (11) of the metal member (10), and a process of removing a resist (40′) and a surface layer portion (13′) of the metal member (10) from the distal portion (13) of the metal member (10).
REFERENCES:
patent: 6320742 (2001-11-01), Wada et al.
patent: 2005/0073818 (2005-04-01), Hirano et al.
patent: 2007/0230091 (2007-10-01), Kobayashi
patent: 2940059 (1991-12-01), None
patent: 2000-243665 (2000-09-01), None
Kobayakawa Ryuta
Nishiyama Toshihiko
Nobuta Tomoki
Suzuki Satoshi
Takahashi Naoki
Ghyka Alexander
Holtz, Holtz, Goodman & Chick, P.C.
NEC Tokin Corporation
Nikmanesh Seahvosh
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