Solar-induced chemical vapor deposition of diamond-type carbon f

Details Solar-induced chemical vapor deposition of diamond-type carbon f Solar-induced chemical vapor deposition of diamond-type carbon f

1993-05-17

1994-09-13

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Photoinitiated chemical vapor deposition

427585, 427249, 4272551, 427299, 427122, 423446, B05D 306, C23C 1600

Patent

active

053467299

ABSTRACT:
An improved chemical vapor deposition method for depositing transparent continuous coatings of sp.sup.3 -bonded diamond-type carbon films, comprising: a) providing a volatile hydrocarbon gas/H.sub.2 reactant mixture in a cold wall vacuum/chemical vapor deposition chamber containing a suitable substrate for said films, at pressure of about 1 to 50 Torr; and b) directing a concentrated solar flux of from about 40 to about 60 watts/cm.sup.2 through said reactant mixture to produce substrate temperatures of about 750.degree. C. to about 950.degree. C. to activate deposition of the film on said substrate.

REFERENCES:
patent: 4565618 (1986-01-01), Banks
patent: 4869923 (1989-09-01), Yamazaki
patent: 4992298 (1991-02-01), Deutchman et al.
patent: 5015494 (1991-05-01), Yamazaki
patent: 5053180 (1991-10-01), Deutchman et al.

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