Software-controlled maskless optical lithography using...

Details Software-controlled maskless optical lithography using... Software-controlled maskless optical lithography using...

2011-06-07

2011-06-07

Young, Christopher G (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C355S053000, C355S055000

Reexamination Certificate

active

07955766

ABSTRACT:
A software-controlled maskless optical lithography system uses fluorescence feedback to control an aspect of the lithography, such as light source dose, wavelength, or flashing instances or duration, spatial light modulator (SLM) pattern, an optics parameter, a beamsplitter control parameter, or movement or positioning of a stage carrying a target workpiece, such as a semiconductor wafer.

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Chan, Kin Foong, et al., “High-resolution maskless lithography”,J. Microlith., Microfab., Microsyst., 2(4), (Oct. 2003), 331-339.
Hastings, J. T., et al., “Nanometer-level stitching in raster-scanning electron-beam lithography using spatial-phase locking”,J. Vac. Sci. Technol. B, 21(6), (Nov./Dec. 2003), 2650-2656.
Sandstrom, Tor, et al., “OML: optical maskless lithography for economic design prototyping and small-volume production”,Proceedings of SPIE—vol. 5377, Optical Microlithography XVII, Bruce W. Smith, Editor, (May 2004), 777-787.

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