Soft proton isolation process for an acoustic charge transport i

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction

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437 22, H01L 2984

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active

054183758

ABSTRACT:
A method for electrically isolating an integrated circuit element in an acoustic charge transport device comprises the steps of providing a semi-insulating substrate; providing an epitaxial layer with a thickness and carrier concentration appropriate for an ACT device; providing a circuit element semiconductor layer in the epitaxial layer for construction of an integrated circuit element, the layer having a thickness substantially less than the thickness of the epitaxial layer and having a carrier concentration substantially greater than the ACT epitaxial layer; laterally isolating the semiconductor layer from other regions of the ACT epitaxial layer; and bombarding the semiconductor layer with protons at a dose sufficient to provide significant vertical electrical isolation from underlying regions of the epitaxial layer semi-insulating with minimal detrimental effect on the electrical characteristics of the semiconductor layer.

REFERENCES:
patent: 3824133 (1974-07-01), D'Asaro et al.
patent: 4124826 (1978-11-01), Dixon et al.
patent: 4290825 (1981-09-01), Dearnaley et al.
patent: 4391651 (1983-07-01), Yoder
patent: 4394180 (1983-07-01), Dearnaley et al.
patent: 4539743 (1985-09-01), Anthony et al.
patent: 4663285 (1986-12-01), Hunsinger et al.
patent: 4884001 (1989-11-01), Sacks et al.
patent: 4926083 (1990-05-01), Merritt et al.
patent: 4980596 (1990-12-01), Sacks et al.
patent: 5047363 (1991-09-01), Hickernell et al.
patent: 5128734 (1992-07-01), Cullen et al.
Zavada et al. Depth Distributors . . . N-Type GaAs, J. App. Phys. 57(6), Mar. 1985 pp. 2299-2301.
Wilson, R. et al., Proton, Deuteron and Helium Implementation . . . Fabrication, J. Appl. Phys. 57(11), Jun. 1985 pp. 5006-5010.
Blood, P., Carrier Removal in Deuterism Irradiated GaAs, Inst. of Physics Conf. Soc. 56(5), 1980, pp. 251-258.
Signon, F. et al., Hot Electron Studies . . . 2.8 MeV Protons, Int. Conf. on Ion Implantation in Semiconductors, May 4-7, 1970.
Foyt, A. Isolation of Junction . . . Bombardment, Solid State Electronics, vol. 12, pp. 209-214, 1969.
Zavada, J. et al., Hydrogen Depth Profiles-N-type GaAs, J. App. Phys. 58(10), Nov. 1985, pp. 3731-3734.

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