Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2007-11-07
2011-11-15
Sheehan, John (Department: 1736)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C148S311000, C148S313000, C420S103000, C420S104000, C420S122000, C420S123000, C420S124000, C420S125000, C420S126000, C420S127000
Reexamination Certificate
active
08057650
ABSTRACT:
A soft-magnetic FeCo based target material is provided which has a high saturation magnetic flux density and superior atmospheric corrosion resistance. The target material is a soft-magnetic FeCo based target material made of an FeCo based alloy. The FeCo based alloy comprises 0 to 30 at. % of one or more metal elements selected from the group consisting of B, Nb, Zr, Ta, Hf, Ti and V; and the balance being Fe and Co with unavoidable impurities. The Fe:Co atomic ratio ranges from 10:90 to 70:30. The FeCo based alloy may further comprise 0.2 at. % to 5.0 at. % of Al and/or Cr.
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Aikawa Yoshikazu
Hayashi Ryoji
Sawada Toshiyuki
Yanagitani Akihiko
Sanyo Special Steel Co., Ltd.
Sheehan John
The Webb Law Firm
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