Chemistry of carbon compounds – Miscellaneous organic carbon compounds
Patent
1976-01-15
1977-01-11
Hoke, V. P.
Chemistry of carbon compounds
Miscellaneous organic carbon compounds
260 4575R, 260 4249, 260 4222, C08K 528, C08K 509, C08K 338, C08K 332, C08K 322, C08K 324
Patent
active
040025977
ABSTRACT:
Smoke retardant vinyl chloride and vinylidene chloride polymer compositions are obtained by including therein a synergistic mixture of (A) at least one nickel compound selected from the group consisting of NiCrO.sub.4, NiMoO.sub.4, Ni.sub.2 O.sub.3, Ni.sub.3 (PO.sub.4).sub.2, nickel metal, nickel formate, and nickel oxalate and (B) at least one vanadium compound selected from the group consisting of LaVO.sub.4, Na.sub.3 VO.sub.4, VB.sub.2, VN, V.sub.2 O.sub.3 and vanadium metal. Substantial smoke retardation is also obtained by including the above nickel compounds or vanadium compounds individually in the vinyl chloride or vinylidene chloride polymer compositions, except for vanadium metal. Hydrates of the additive compounds may also be used.
REFERENCES:
patent: 3846372 (1974-11-01), Mitchell
patent: 3878167 (1975-04-01), Kroenke
patent: 3883482 (1975-05-01), Kroenke
patent: 3900441 (1975-08-01), King
patent: 3903028 (1975-09-01), Mitchell
patent: 3914201 (1975-10-01), Kroenke
patent: 3933742 (1976-01-01), Dickens
patent: 3962163 (1976-06-01), Dickens
patent: 3962177 (1976-06-01), Douglas
patent: 3965068 (1976-06-01), Dickens
patent: 3968064 (1976-07-01), Dickens
patent: 3970638 (1976-07-01), Dickens
Crehore Charles A.
Hoke V. P.
Powell, Jr. J. Hughes
The B. F. Goodrich Company
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