Slurry recycling system and method for CMP apparatus

Details Slurry recycling system and method for CMP apparatus Slurry recycling system and method for CMP apparatus

1998-06-23

2000-08-22

Lithgow, Thomas M.

Liquid purification or separation

Processes

Including controlling process in response to a sensed condition

210663, 210669, 210681, 210688, 210739, 210 961, 210167, 210196, 210266, 2104161, 451 54, 451 60, 451287, 451446, 438692, 438693, B24B 100, B24B 5702, H01L 2100

Patent

active

061067288

ABSTRACT:
A slurry recycling system for a CMP apparatus includes a flow path through which a slurry used in the CMP apparatus flows. A first filter is disposed in the flow path for filtering out foreign matter of a particle size of more than 0.5 microns mixed in said slurry. A second filter is preferably disposed in the flow path at a location upstream of and away from the first filter for filtering out foreign matter of a particle size of more than 10 microns mixed in said slurry. Preferably, provisions are made for a concentration adjuster for adjusting the concentration of abrasives in said slurry to substantially an initial value before use, and a pH adjuster for adjusting the pH of said slurry to substantially an initial pH value before use.

REFERENCES:
patent: 5664990 (1997-09-01), Adams
patent: 5932486 (1999-08-01), Cook et al.

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