Slurry providing system

Details Slurry providing system Slurry providing system

1998-08-28

2000-10-17

Soohoo, Tony G.

Agitating

Having specified feed means

Responsive to condition sensor

3661551, 366136, 366144, 451446, B01F 1502, B01F 1506

Patent

active

061320781

ABSTRACT:
A slurry providing system, located between a main slurry providing system and a CMP machine, includes a providing barrel, which can either be used as a buffer tank to provide slurry to the CMP machine with interruption, or as an independent backup tank for store slurry. The providing barrel also includes an impeller to stir slurry to prevent slurry deposition, and a liquid level sensor to monitor slurry level. The slurry providing system further includes a pump to continuously provide slurry from the providing barrel when the main slurry providing system is down. There is a pressure-regulating valve between the slurry providing system and the CMP machine.

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