Slurry for chemical mechanical polishing

Details Slurry for chemical mechanical polishing Slurry for chemical mechanical polishing

2007-06-12

2007-06-12

Norton, Nadine G. (Department: 1765)

Compositions

Etching or brightening compositions

C252S079400, C438S692000

Reexamination Certificate

active

10616914

ABSTRACT:
The present invention relates to a slurry for chemical mechanical polishing, which contains a silica polishing material, an oxidizing agent, a benzotriazole-based compound, a diketone and water.

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patent: WO 98/49723 (1998-11-01), None

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