Slurry comprising a ligand or chelating agent for polishing a su

Details Slurry comprising a ligand or chelating agent for polishing a su Slurry comprising a ligand or chelating agent for polishing a su

1998-05-28

2000-12-12

Scherbel, David A.

Abrading

Abrading process

Utilizing fluent abradant

451 41, B24B 100

Patent

active

061590762

ABSTRACT:
A novel slurry for polishing and a method of polishing using a slurry is disclosed. The slurry may include a colloidal silica abrasive in an aqueous solution. The slurry further includes a chelating agent that is believed to remove adsorbed ions from the surface of the layer being polished. The method may be used to polish a surface comprising, for example nickel and the chelating agent may be, for example, ammonium oxalate.

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