Drying and gas or vapor contact with solids – Apparatus – With means to treat gas or vapor
Patent
1987-01-27
1988-06-14
Schwartz, Larry I.
Drying and gas or vapor contact with solids
Apparatus
With means to treat gas or vapor
34182, 34183, 34180, 432214, 432215, F26B 1510
Patent
active
047502746
ABSTRACT:
Methods for continuous drying of sludges. Large scouring particles are added to a sludge to be dried to create a mixture which is passed through a rotary screw type indirect heat exchanger. The scouring particles are large relative to the particulates of suspended and dissolved solids which result from drying in the heat exchanger. During the process of drying and conveying the mixture through the heat exchanger the scouring particles continuously remove the particulate residue from the surfaces of the heat exchanger. It also appears that the particles assist in the actual heat transfer between the heat exchanger surfaces and the sludge by absorbing and subsequently releasing heat through relatively large surface areas. The scouring particles can be consumptive, that is, consumed in processes during subsequent handling of the residue, or nonconsumptive. In the nonconsumptive case, upon discharge from the heat exchanger the scouring particles are separated from the particulate residue and recycled for mixing again with the sludge.
REFERENCES:
patent: 3775041 (1973-11-01), Buttner
patent: 3776774 (1973-12-01), Miller
patent: 3800865 (1974-04-01), Onarheim et al.
patent: 3808701 (1974-05-01), Bachmann
patent: 4193206 (1980-03-01), Maffet
patent: 4579596 (1986-04-01), Murzyn
Erdman, Jr. Andrew
Johnson Jeffrey C.
Levad Jerry A.
Haden Schweitzer Corp.
Joy Manufacturing Co.
Levine Edward L.
Schwartz Larry I.
LandOfFree
Sludge processing does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Sludge processing, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sludge processing will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-497701