Etching a substrate: processes – Forming or treating electrical conductor article – Forming or treating of groove or through hole
Reexamination Certificate
2011-07-05
2011-07-05
Deo, Duy-Vu N (Department: 1713)
Etching a substrate: processes
Forming or treating electrical conductor article
Forming or treating of groove or through hole
C216S037000, C216S067000, C385S015000, C385S043000, C385S050000, C385S129000, C385S010000
Reexamination Certificate
active
07972522
ABSTRACT:
The invention relates to a method for producing a slotted guide, in which:a) a layer of a material having a refractive index less than that of silicon, for example Material having a refractive index less than that of silicon (26), is formed on an etching barrier layer (22),b) two parallel trenches are etched into said material having a refractive index less than that of silicon, with the etching barrier on said etching barrier layer, these two trenches being separated by a wall of said material having a refractive index less than that of silicon (36),c) the trenches thus made are filled with silicon (42, 44).
REFERENCES:
patent: 4473598 (1984-09-01), Ephrath et al.
patent: 5888876 (1999-03-01), Shiozawa et al.
patent: 6108464 (2000-08-01), Foresi et al.
patent: 6228691 (2001-05-01), Doyle
patent: 6391214 (2002-05-01), Kovacic
patent: 2003/0000918 (2003-01-01), Kheraj et al.
patent: 2004/0077178 (2004-04-01), Yang et al.
patent: 2005/0089291 (2005-04-01), Yamada
patent: 2006/0037364 (2006-02-01), Chang et al.
patent: 2006/0228074 (2006-10-01), Lipson et al.
patent: 2007/0114628 (2007-05-01), Barrios et al.
Virginia Semiconductor, The General Properties of Si, Ge, SiGe, SiO2 and Si3N4, Jun. 2002. pp. 1-5.
V.R. Almeida et al.: “Guiding and Confining Light in Void Nanostructure”, Optics Letters, Osa, Optical Society of America, Washington, DC, US, vol. 29, No. 11, Jun. 1, 2004, pp. 1209-1211.
T. Baehr-Jones et al.: “Optical Modulation and Detection in Slotted Silicon Waveguides”, Optics Express, 13(14), pp. 5216-5226, 2005.
C.A. Barrios et al.: “Electrically driven silicon resonant light emitting device based on slot-waveguide”, Optics Express Opt. Soc. America USA, vol. 13, No. 25, Dec. 12, 2005, pp. 10092-10101.
C.A. Barrios et al.: “High Performance All-Optical Silicon Microswitch”, Electronic Letters Soc., vol. 40 No. 14, Jul. 8, 2004, pp. 862-863.
J.M. Fedeli, S. Laval: “Microphonique silicium pour connexions rapides sur circuit integre”, Les Composants Electroniques, No. 9, Oct. 2002, pp. 62-67.
G. Vijaya Prakash et al.: “Linear and Nonlinear Optical Properties of Plasma-Enhanced Chemical-Vapour Deposition Grown Silicon Noncrystals”, Journal of Modern Optics, vol. 49, No. 5-6, Sep. 3, 2001, pp. 719-720.
Q. Xu et al.: “Experimental Demonstration of Guiding and Confining Light in Nanometer-Size Low-Refractive-Index Material”, Optics Letters, vol. 29, No. 14, Jul. 15, 2004.
French Preliminary Search Report, EP 07 11 9452, dated Dec. 19, 2007.
Weiss et al., “The Transmission Properties for Optical Waveguides in SIMOX Structures,” Optical and Quantum Electronics, vol. 23, 1991, pp. 1061-1065.
Prieto et al., “Integrated Mach Zehnder Interferometer Based on ARROW Structures for Biosensor Applications,” Sensors and Actuators, vol. B92, 2003, pp. 151-158.
Kim et al., “Influence of Hydrogen on Si02 Thick Film Deposited by PECVD and FHD for Silica Optical Waveguide,” Crystal Research and Technology, vol. 37, 2002, pp. 1257-1263.
T. Fujisawa et al., “Theoretical Investigation of Ultrasmall Polarization-Insensitive 1*2 Multimode Interference Waveguides Based on Sandwiched Structures,” IEEE Photonics Technology Letters vol. 18, No. 11, Jun. 1, 2006, pp. 1246-1248.
G. Vijaya Prakash et al., “Nonlinear Optical Properties of Silicon Nanocrystals Grown by Plasma-Enhanced Chemical Vapor Deposition,” Journal of Applied Physics, vol. 91, No. 7, 2002, pp. 4607-4610.
French Preliminary Search Report for French Application No. FR 0654670, dated Jun. 6, 2007.
Office Action in U.S. Appl. No. 11/982,140, dated Jul. 26, 2010.
Office Action in U.S. Appl. No. 11/982,140, mailed Feb. 16, 2011.
European Search Report for European Application No. 07119452.6, dated Jan. 4, 2008.
French Preliminary Search Report for French Application No. FR 0654669, dated May 31, 2007.
El Melhaoui Loubna
Fedeli Jean-Marc
Jordana Emmanuel
Angadi Maki A
Commissariat a l''Energie Atomique
Deo Duy-Vu N
Nixon & Peabody LLP
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