Slotted guide structure

Etching a substrate: processes – Forming or treating electrical conductor article – Forming or treating of groove or through hole

Reexamination Certificate

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Details

C216S037000, C216S067000, C385S015000, C385S043000, C385S050000, C385S129000, C385S010000

Reexamination Certificate

active

07972522

ABSTRACT:
The invention relates to a method for producing a slotted guide, in which:a) a layer of a material having a refractive index less than that of silicon, for example Material having a refractive index less than that of silicon (26), is formed on an etching barrier layer (22),b) two parallel trenches are etched into said material having a refractive index less than that of silicon, with the etching barrier on said etching barrier layer, these two trenches being separated by a wall of said material having a refractive index less than that of silicon (36),c) the trenches thus made are filled with silicon (42, 44).

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