Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1990-07-10
1991-12-17
Nguyen, Nam X.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429812, 20429823, 20419212, C23C 1434
Patent
active
050732455
ABSTRACT:
A magnetron sputtering device for coating planar substrates with sputtered ions. The sputtering occurs from the internal wall of a cylindrical hollow flanged cathode target that includes a slot longitudinally disposed in a sidewall of the cathode. A first portion of sputtered atoms travel through the slot and onto a planar substrate moving relative to the sputtering device and a second portion of sputtered atoms simply redeposit on the internal wall of the cathode target such that the target cathode evenly erodes.
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Andras Joseph C.
Nguyen Nam X.
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