Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1993-11-15
1995-08-01
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429812, 20429818, 20429826, 20419212, C23C 1434
Patent
active
054377781
ABSTRACT:
The invention is an expandable magnetron sputtering system based on an elongated hollow cylindrical cathode member. A magnetic field is provided parallel to an axial wall of the hollow cathode member to create a physical trap for containing a glow discharge therein. Removable end plugs are provided, if necessary, to help create the physical trap. The hollow cathode member may be solid or any contain one or more slots, as appropriate, for the substrate to be coated (filament-like versus planar) and the mode of operation selected (pass-by versus pass-through). The cathode members may be connected together (with anodes as needed) to extend the length of a sputtering path. A plurality of single-slot cathodes may be cost effectively formed and operated in a single monolithic slab of material.
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Nguyen Nam
Telic Technologies Corporation
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