Slotted antenna waveguide plasma source

Details Slotted antenna waveguide plasma source Slotted antenna waveguide plasma source

2007-12-11

2007-12-11

Hassanzadeh, Parviz (Department: 1763)

Coating apparatus

Gas or vapor deposition

With treating means

C118S7230MW, C156S345410, C156S345420

Reexamination Certificate

active

10925499

ABSTRACT:
A high density plasma generated by microwave injection using a windowless electrodeless rectangular slotted antenna waveguide plasma source has been demonstrated. Plasma probe measurements indicate that the source could be applicable for low power ion thruster applications, ion implantation, and related applications. This slotted antenna plasma source invention operates on the principle of electron cyclotron resonance (ECR). It employs no window and it is completely electrodeless and therefore its operation lifetime is long, being limited only by either the microwave generator itself or charged particle extraction grids if used. The high density plasma source can also be used to extract an electron beam that can be used as a plasma cathode neutralizer for ion source beam neutralization applications.

REFERENCES:
patent: 3604012 (1971-09-01), Lindley
patent: 5466295 (1995-11-01), Getty
patent: 5579019 (1996-11-01), Uematsu et al.
patent: 5783102 (1998-07-01), Keller
patent: 5891252 (1999-04-01), Yokogawa et al.
patent: 6033481 (2000-03-01), Yokogawa et al.
patent: 6190496 (2001-02-01), DeOrnellas et al.
patent: 6196155 (2001-03-01), Setoyama et al.
patent: 6294862 (2001-09-01), Brailove et al.
patent: 6350347 (2002-02-01), Ishii et al.
patent: 6376796 (2002-04-01), Sato et al.
patent: 6380684 (2002-04-01), Li et al.
patent: 6390019 (2002-05-01), Grimbergen et al.
patent: 6504159 (2003-01-01), Keller
patent: 6551445 (2003-04-01), Yokogawa et al.
patent: 6632324 (2003-10-01), Chan
patent: 2001/0008171 (2001-07-01), Fukuda et al.
patent: 2003/0062129 (2003-04-01), Ni
patent: 2003/0150562 (2003-08-01), Quon
patent: 2004/0090290 (2004-05-01), Teshirogi et al.
Foster “Discharge Characterization of 40 cm-Microwave ECR Ion Source and Neutralizer” NASA Gleen Research Center, Cleveland, OH, no date available.

Affiliated with

Also associated with

Rating

Slotted antenna waveguide plasma source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Slotted antenna waveguide plasma source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Slotted antenna waveguide plasma source will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3866766