Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture
Reexamination Certificate
2005-10-18
2005-10-18
Silverman, Stanley S. (Department: 1754)
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
C204S157300, C204S157970, C204S164000, C204S177000, C204S179000, C422S186040, C423S235000, C423S242100, C423S245100, C423S585000
Reexamination Certificate
active
06955794
ABSTRACT:
A plasma reactor including a first dielectric having at least one slot defined therethrough, and a segmented electrode including a plurality of electrode segments, each electrode segment is disposed proximate an associated slot. Each electrode segment may be formed in different shapes, for example, a plate, bar, rim, or plug. The electrode segment may be hollow, solid, or made from a porous material. The reactor may include a second electrode and dielectric with the first and second dielectrics separated by a predetermined distance to form a channel therebetween into which the plasma exiting from the slots defined in the first dielectric is discharged. The fluid to be treated is passed through the channel and exposed to the plasma discharge. If the electrode segment is hollow or made of a porous material, then the fluid/gas to be treated may be fed into the slots defined in the first dielectric and exposed therein to the maximum plasma density. Thus, the fluid/gas to be treated may be exposed to the plasma discharge both in the slots as well as in the channel between the two dielectrics. The plasma reactor is more energy efficient than conventional devices and does not require a carrier gas to remain stable at atmospheric pressure. The plasma reactor has a wide range of application, such as the destruction of pollutants in a fluid, the generation of ozone, the pretreatment of air for modifying or improving combustion, and the destruction of various organic compounds, and surface cleaning of objects.
REFERENCES:
patent: 3594065 (1971-07-01), Marks
patent: 3948601 (1976-04-01), Fraser et al.
patent: 4147522 (1979-04-01), Gonas et al.
patent: 4357151 (1982-11-01), Helfritch et al.
patent: 4698551 (1987-10-01), Hoag
patent: 4818488 (1989-04-01), Jacob
patent: 4885074 (1989-12-01), Susko et al.
patent: 4898715 (1990-02-01), Jacob
patent: 4931261 (1990-06-01), Jacob
patent: 5033355 (1991-07-01), Goldstein et al.
patent: 5062708 (1991-11-01), Liang et al.
patent: 5084239 (1992-01-01), Moulton et al.
patent: 5115166 (1992-05-01), Campbell et al.
patent: 5178829 (1993-01-01), Moulton et al.
patent: 5184046 (1993-02-01), Campbell
patent: 5186893 (1993-02-01), Moulton et al.
patent: 5288460 (1994-02-01), Caputo et al.
patent: 5325020 (1994-06-01), Campbell et al.
patent: 5376332 (1994-12-01), Martens et al.
patent: 5387842 (1995-02-01), Roth et al.
patent: 5408160 (1995-04-01), Fox
patent: 5413758 (1995-05-01), Caputo et al.
patent: 5413759 (1995-05-01), Campbell et al.
patent: 5413760 (1995-05-01), Campbell et al.
patent: 5414324 (1995-05-01), Roth et al.
patent: 5451368 (1995-09-01), Jacob
patent: 5472664 (1995-12-01), Campbell et al.
patent: 5476501 (1995-12-01), Stewart et al.
patent: 5482684 (1996-01-01), Martens et al.
patent: 5498526 (1996-03-01), Caputo et al.
patent: 5549735 (1996-08-01), Coppom
patent: 5593476 (1997-01-01), Coppom
patent: 5593550 (1997-01-01), Stewart et al.
patent: 5593649 (1997-01-01), Fisher et al.
patent: 5594446 (1997-01-01), Vidmar et al.
patent: 5603895 (1997-02-01), Martens et al.
patent: 5620656 (1997-04-01), Wensky et al.
patent: 5637198 (1997-06-01), Breault
patent: 5645796 (1997-07-01), Caputo et al.
patent: 5650693 (1997-07-01), Campbell et al.
patent: 5667753 (1997-09-01), Jacobs et al.
patent: 5669583 (1997-09-01), Roth
patent: 5686789 (1997-11-01), Schoenbach et al.
patent: 5695619 (1997-12-01), Williamson et al.
patent: 5733360 (1998-03-01), Feldman et al.
patent: 5753196 (1998-05-01), Martens et al.
patent: 5872426 (1999-02-01), Kunhardt et al.
patent: 5939829 (1999-08-01), Schoenbach et al.
patent: 6007742 (1999-12-01), Czernichowski et al.
patent: 6016027 (2000-01-01), DeTemple et al.
patent: 6027616 (2000-02-01), Babko-Malyi
patent: 6055349 (2000-04-01), Seino et al.
patent: 6113851 (2000-09-01), Soloshenko et al.
patent: 6146724 (2000-11-01), Roth
patent: 6147452 (2000-11-01), Kunhardt et al.
patent: 6170668 (2001-01-01), Babko-Malyi
patent: 6228330 (2001-05-01), Herrmann et al.
patent: 6232723 (2001-05-01), Alexeff
patent: 6245126 (2001-06-01), Feldman et al.
patent: 6245132 (2001-06-01), Feldman et al.
patent: 6255777 (2001-07-01), Kim et al.
patent: 6322757 (2001-11-01), Cohn et al.
patent: 6325972 (2001-12-01), Jacobs et al.
patent: 6333002 (2001-12-01), Jacobs et al.
patent: 6365112 (2002-04-01), Babko-Malyi et al.
patent: 6372192 (2002-04-01), Paulauskas et al.
patent: 6375832 (2002-04-01), Eliasson et al.
patent: 6383345 (2002-05-01), Kim et al.
patent: 6395197 (2002-05-01), Detering et al.
patent: 6399159 (2002-06-01), Grace et al.
patent: 6433480 (2002-08-01), Stark et al.
patent: 6451254 (2002-09-01), Wang et al.
patent: 6458321 (2002-10-01), Platt, Jr. et al.
patent: 6475049 (2002-11-01), Kim et al.
patent: 6497839 (2002-12-01), Kasegawa et al.
patent: 6509689 (2003-01-01), Kim et al.
patent: 6545411 (2003-04-01), Kim et al.
patent: 6548957 (2003-04-01), Kim et al.
patent: 6570172 (2003-05-01), Kim et al.
patent: 6580217 (2003-06-01), Kim et al.
patent: 6598481 (2003-07-01), Schultz
patent: 6599471 (2003-07-01), Jacobs et al.
patent: 6627150 (2003-09-01), Wang et al.
patent: 6632323 (2003-10-01), Kim et al.
patent: 6635153 (2003-10-01), Whitehead
patent: 6673522 (2004-01-01), Kim et al.
patent: 6685523 (2004-02-01), Kim et al.
patent: 6818193 (2004-11-01), Christodoulatos et al.
patent: 2001/0031234 (2001-10-01), Christodoulatos et al.
patent: 2002/0011203 (2002-01-01), Kim
patent: 2002/0011770 (2002-01-01), Kim et al.
patent: 2002/0045396 (2002-04-01), Kim
patent: 2002/0092616 (2002-07-01), Kim
patent: 2002/0105259 (2002-08-01), Kim
patent: 2002/0105262 (2002-08-01), Kim
patent: 2002/0122896 (2002-09-01), Kim et al.
patent: 2002/0124947 (2002-09-01), Kim
patent: 2002/0126068 (2002-09-01), Kim et al.
patent: 2002/0127972 (2002-09-01), Kim et al.
patent: 2002/0139659 (2002-10-01), Yu et al.
patent: 2002/0144903 (2002-10-01), Kim et al.
patent: 2002/0148816 (2002-10-01), Jung et al.
patent: 2002/0187066 (2002-12-01), Yu et al.
patent: 2003/0003767 (2003-01-01), Kim et al.
patent: 2003/0015505 (2003-01-01), Yu et al.
patent: 2003/0035754 (2003-02-01), Sias et al.
patent: 2003/0048240 (2003-03-01), Shin et al.
patent: 2003/0048241 (2003-03-01), Shin et al.
patent: 2003/0062837 (2003-04-01), Shin et al.
patent: 2003/0070760 (2003-04-01), Kim et al.
patent: 2003/0071571 (2003-04-01), Yu et al.
patent: 2003/0085656 (2003-05-01), Kunhardt et al.
patent: 2003/0127984 (2003-07-01), Kim et al.
patent: 2003/0134506 (2003-07-01), Kim et al.
patent: 2003/0141187 (2003-07-01), Sohn et al.
patent: 2004/0022673 (2004-02-01), Protic
patent: 1 084 713 (2001-03-01), None
patent: 1 378 253 (2004-01-01), None
patent: 0144790 (2001-06-01), None
patent: WO-02/49767 (2002-06-01), None
International Search Report for PCT/US03/05222, dated Oct. 23, 2003.
Vidmar, R.J., “On the Use of Atmospheric Pressure Plasmas as Electromagnetic Reflectors and Absorbers”,IEEE Transactions on Plasma Science, vol. 18 No. 4, Aug. 1990; pp. 733-741.
Kunhardt, E.E., “Generation of Large-Volume, Atmospheric-Pressure, Nonequilibrium Plasmas”,IEEE Transactions on Plasma Science, vol. 28 No. 1, pp. 189-200, Feb. 2000.
Penetrante et al., “Non-Thermal Plasma Techniques for Abatement of Violatile Organic Compounds and Nitrogen Oxides”,INP Report XIII, pp. 18-46 (1996).
Chen D.C.C., Lawton, J., and Weinberg, F.J., Augmenting Flumes with Electric Discharges.Tenth Symposium(Int'l)on Combustion, pp. 743-754 (1965).
Becker, K. v. Tarnovsky, V.,Plasma Sources Science and Technology, vol. 4, pp. 307-315 (1995).
Knight, Henry de Boyne, The Arc Discharge; Its Application to Power Control, LondonChapman&Hall(1960).
L.A. Rosenthal and D.A. Davis, “Electrical Characterization of a Corona Discharge for Surface Treatment”,IEEE Transactions on Industry Applications, vol. 1A-11, No. 3, pp. 328-335 (May/Jun. 1975).
S. Han, Y. Lee, H. Kim, J. Lee, J. Yoon, and G. Kim, “Polymer Surface Modification by Plasma Source Ion Implantation”,Surfaces and Coatings Technology, vol. 93, pp. 261-264 (1997).
Kolman et al., “Genotoxic
Crowe Richard
Epstein Michael
Houston, Jr. Edward J.
Kovach Kurt
Tropper Seth
Medina Maribel
Plasmasol Corporation
Silverman Stanley S.
LandOfFree
Slot discharge non-thermal plasma apparatus and process for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Slot discharge non-thermal plasma apparatus and process for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Slot discharge non-thermal plasma apparatus and process for... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3488764