Slant reflector with bump structure and method of...

Details Slant reflector with bump structure and method of... Slant reflector with bump structure and method of...

2005-05-10

2005-05-10

Chowdhury, Tarifur R. (Department: 2871)

Liquid crystal cells, elements and systems

Nominal manufacturing methods or post manufacturing...

C349S113000, C438S030000

Reexamination Certificate

active

06891591

ABSTRACT:
A method of fabricating slant reflector with bump structure, at least comprising the steps of: providing a substrate; forming a photosensitivity material layer on the substrate; patterning the photosensitivity material layer to form m groups of pattern (m≧1, m is positive integral), and each group of pattern includes a plurality of bumps with different bottom area; and jointing the bumps to form a slant surface with bump structure. The photosensitivity material layer is either orderly or randomly patterned to form m groups of patterns. The step of patterning the photosensitivity material layer includes exposing and developing. The invention utilizes one photo-mask with particular pattern to fabricate the bump structure in a simple way.

REFERENCES:
patent: 5408345 (1995-04-01), Mitsui et al.
patent: 5610741 (1997-03-01), Kimura
patent: 5691791 (1997-11-01), Nakamura et al.
patent: 6291146 (2001-09-01), Chang et al.
patent: 6452653 (2002-09-01), Yamanaka et al.
patent: 10010525 (1998-01-01), None
High Brightness Reflective TFE-LCD, Dec. 1999 and English-language Abstract.

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