Skin treatment method and solution

Drug – bio-affecting and body treating compositions – Live hair or scalp treating compositions – Amphoteric or zwitterionic surfactant containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

424680, 514859, 514864, 514880, 514881, A61K 706, A61K 7075

Patent

active

051166062

ABSTRACT:
Skin treatment solution and method having an aqueous, dissociable, sodium salt solution with a pH in the 6.0-8.0 range and containing enough sodium to substantially remove testosterone from the skin area to which the solution is applied topically. The sodium salt solution has sodium chloride as the major salt constituent and much smaller amounts of choline chloride, inositol, pantothenic acid and vitamin E, as well as a surfactant and sodium fluoride as a preservative.

REFERENCES:
patent: 711263 (1902-10-01), Robertson
patent: 3579632 (1971-05-01), Sonnen
patent: 3689669 (1972-09-01), Piette
patent: 3928251 (1975-12-01), Bolich, Jr. et al.
patent: 4088760 (1978-05-01), Benson et al.
patent: 4174296 (1979-11-01), Kass
patent: 4515778 (1985-05-01), Kastell
patent: 4606913 (1986-08-01), Aronson et al.
patent: 4660580 (1987-04-01), Hoch et al.
patent: 4719194 (1988-01-01), Patel
patent: 4765975 (1988-08-01), Iovanni et al.
patent: 4971784 (1990-11-01), Holzel et al.
Article "Extracellular Androgen Binding Protein", C. Wayne Bardin, et al Ann. Rev. Physiol, 1981, 43:189-98.
Article,--J. Soc. Cosmetic Chemists 1965 16:431-446, "The Hormonal Background of the Skin", Dodds.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Skin treatment method and solution does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Skin treatment method and solution, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Skin treatment method and solution will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-418156

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.