Drug – bio-affecting and body treating compositions – Preparations characterized by special physical form
Reexamination Certificate
2011-08-09
2011-08-09
Kosar, Andrew D (Department: 1619)
Drug, bio-affecting and body treating compositions
Preparations characterized by special physical form
C523S102000, C523S105000
Reexamination Certificate
active
07993661
ABSTRACT:
The present invention relates to a skin make-up or care composition containing a liquid fatty phase having at least one resin having a number-average molecular weight of less than or equal to 10 000 g/mol, chosen from rosin, rosin derivatives, hydrocarbon-based resins, and mixtures thereof. The invention also relates to a non-therapeutic use of the invention composition in a process for making up or caring for the skin and for obtaining a deposit on the skin which has good transfer resistance, in particular in the presence of sebum.
REFERENCES:
patent: 4536405 (1985-08-01), Nara et al.
patent: 4918130 (1990-04-01), Kano et al.
patent: 5618883 (1997-04-01), Plamthottam et al.
patent: 5961998 (1999-10-01), Arnaud et al.
patent: 6132665 (2000-10-01), Bui et al.
patent: 6187300 (2001-02-01), Motley et al.
patent: 6517818 (2003-02-01), Golz-Berner et al.
patent: 6524594 (2003-02-01), Santora et al.
patent: 6544642 (2003-04-01), Cinelli et al.
patent: 2002/0168335 (2002-11-01), Collin
patent: WO 02/41854 (2002-05-01), None
U.S. Appl. No. 09/492,796, filed Jan. 28, 2000, Arnaud, et al.
U.S. Appl. No. 08/815,577, filed Mar. 12, 1997, Arnaud, et al.
Arnaud Pascal
Lu Shaoxiang
"L'Oreal"
Kosar Andrew D
Mattison Lori K
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
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