Skin cleansing compositions

Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C510S137000, C510S159000, C510S424000, C510S471000

Reexamination Certificate

active

07858567

ABSTRACT:
A skin cleansing composition contains the following ingredients (A), (B) and (C):(A) a polyoxyethylene alkylether sulfate,(B) a polyoxyethylene alkylether carboxylate, and(C) a cationic group-containing polymer having a cationic charge density of not less than 4.5 meq/g, and/or polyvinylpyrrolidone. A weight ratio (A):(B) of the ingredient (A) to the ingredient (B) is from 85:15 to 25:75. A total content of the ingredients (A) and (B) based on the whole composition ranges from 5 to 25 wt %. A content of the ingredient (C) ranges from 0.05 to 1 wt %. The skin cleansing composition is excellent in foamability and foam quality, and provides a good stop feeling during rinsing and a refreshed touch feeling after towel blotting.

REFERENCES:
patent: 5057311 (1991-10-01), Kamegai et al.
patent: 6312678 (2001-11-01), Elliott et al.
patent: 6444629 (2002-09-01), Elliott et al.
patent: 2007/0269397 (2007-11-01), Terada
patent: 02-042013 (1990-02-01), None
patent: 09-165598 (1997-06-01), None
patent: 2001-513538 (2001-09-01), None
patent: 2001-513539 (2001-09-01), None
U.S. Appl. No. 12/115,206, filed May 5, 2008, Yamamoto, et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Skin cleansing compositions does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Skin cleansing compositions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Skin cleansing compositions will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4183646

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.